NexSil™ 20NH4 is an aqueous ammonia-stabilized colloidal silica product developed for diverse applications. It is offered with options for particle size, surface area, and pH to suit various needs.

Chemical Family: Silica

Applicable Processes: Investment Casting

Technical Data Sheet

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Identification & Functionality

Applications & Uses

Markets
Applications
Applicable Processes
Compatible Substrates & Surfaces
Industrial Additives End Use
Product Applications

NexSil™ 20NH4 colloidal silica was developed to be utilized in a range of applications. These materials may be used in applications related to:

  • Production of vacuum-formed fibrous refractory products.
  • Binder formulations for the production of materials such as granulated powders.
  • Surface modification for anti-slip paper and cardboard coatings.
  • Anti-blocking effects for films and coatings, including steel coatings.
  • Catalyst production.
  • Precision polishing of silicon wafers.
  • Precision polishing of semiconductor substrates.
  • Binder formulations for precision investment casting.

Properties

Counter Ion
Ammonia
Typical Properties
ValueUnitsTest Method / Conditions
Typical Particle Size20nm
Typical Surface Area135m²/g
Silicon Dioxide Content40wt%-
pH Value (at 25°C)9.8--
Specific Gravity1.3--
Particle ChargeNegative--

Packaging & Availability